{"cited_by_count":1024648,"description":"This cluster of papers focuses on the use of ion beam techniques, such as Secondary Ion Mass Spectrometry (SIMS) and swift heavy ions, for surface analysis, nanoscale patterning, and molecular imaging. It covers a wide range of applications including surface engineering, nanostructure fabrication, and depth profiling of biological samples.","display_name":"Ion-surface interactions and analysis","domain_id":"3","external_ids":{"openalex":"https://openalex.org/T12166","wikipedia":"https://en.wikipedia.org/wiki/Secondary_ion_mass_spectrometry"},"field_id":"22","id":"T12166","keywords":[{"display_name":"ion implantation","id":"ion-implantation","score":0.2386,"url":"https://openalex.org/keywords/ion-implantation"},{"display_name":"ion-surface interaction","id":"ion-surface-interaction","score":0.6326,"url":"https://openalex.org/keywords/ion-surface-interaction"},{"display_name":"secondary ion mass spectrometry","id":"secondary-ion-mass-spectrometry","score":0.4341,"url":"https://openalex.org/keywords/secondary-ion-mass-spectrometry"},{"display_name":"sputtering","id":"sputtering","score":0.2028,"url":"https://openalex.org/keywords/sputtering"},{"display_name":"ion bombardment","id":"ion-bombardment","score":0.3107,"url":"https://openalex.org/keywords/ion-bombardment"},{"display_name":"depth profiling","id":"depth-profiling","score":0.2917,"url":"https://openalex.org/keywords/depth-profiling"},{"display_name":"ion-solid interaction","id":"ion-solid-interaction","score":0.7108,"url":"https://openalex.org/keywords/ion-solid-interaction"},{"display_name":"sputtering yield","id":"sputtering-yield","score":0.6294,"url":"https://openalex.org/keywords/sputtering-yield"},{"display_name":"Rutherford backscattering spectrometry","id":"rutherford-backscattering-spectrometry","score":0.4099,"url":"https://openalex.org/keywords/rutherford-backscattering-spectrometry"},{"display_name":"stopping power","id":"stopping-power","score":0.3444,"url":"https://openalex.org/keywords/stopping-power"},{"display_name":"electronic stopping power","id":"electronic-stopping-power","score":0.5088,"url":"https://openalex.org/keywords/electronic-stopping-power"},{"display_name":"time-of-flight secondary ion mass spectrometry","id":"time-of-flight-secondary-ion-mass-spectrometry","score":0.4012,"url":"https://openalex.org/keywords/time-of-flight-secondary-ion-mass-spectrometry"},{"display_name":"ion channeling","id":"ion-channeling","score":0.3707,"url":"https://openalex.org/keywords/ion-channeling"},{"display_name":"focused ion beam","id":"focused-ion-beam","score":0.2728,"url":"https://openalex.org/keywords/focused-ion-beam"},{"display_name":"nitrogen ion implantation","id":"nitrogen-ion-implantation","score":0.2278,"url":"https://openalex.org/keywords/nitrogen-ion-implantation"},{"display_name":"ion beam analysis","id":"ion-beam-analysis","score":0.5013,"url":"https://openalex.org/keywords/ion-beam-analysis"},{"display_name":"argon ion bombardment","id":"argon-ion-bombardment","score":0.4872,"url":"https://openalex.org/keywords/argon-ion-bombardment"},{"display_name":"secondary ion emission","id":"secondary-ion-emission","score":0.835,"url":"https://openalex.org/keywords/secondary-ion-emission"},{"display_name":"ion energy dependence","id":"ion-energy-dependence","score":0.4954,"url":"https://openalex.org/keywords/ion-energy-dependence"},{"display_name":"argon ions","id":"argon-ions","score":0.2904,"url":"https://openalex.org/keywords/argon-ions"},{"display_name":"ion beam mixing","id":"ion-beam-mixing","score":0.4282,"url":"https://openalex.org/keywords/ion-beam-mixing"},{"display_name":"ion sputtering","id":"ion-sputtering","score":0.407,"url":"https://openalex.org/keywords/ion-sputtering"},{"display_name":"boron implantation","id":"boron-implantation","score":0.2343,"url":"https://openalex.org/keywords/boron-implantation"},{"display_name":"ion fluence","id":"ion-fluence","score":0.3546,"url":"https://openalex.org/keywords/ion-fluence"},{"display_name":"depth resolution","id":"depth-resolution","score":0.2943,"url":"https://openalex.org/keywords/depth-resolution"}],"legacy_keywords":["Ion Beam","Surface Analysis","Secondary Ion Mass Spectrometry","Nanoscale Patterning","Cluster Ion","Time-of-Flight","Molecular Imaging","Swift Heavy Ions","Surface Engineering","Nanostructures"],"openalex_id":"https://openalex.org/T12166","source_created_date":"2024-01-23T15:27:13","source_updated_date":"2026-10-17T03:02:00","subfield_id":"2206","url":"/topics/T12166","works_api_url":"https://api.openalex.org/works?filter=topics.id:T12166","works_count":89611,"label":"Ion-surface interactions and analysis","provider":"openalex","revision":"1e6208e4dc70ae08","taxonomy_revision":"f050b5d4780b1289","title":"Ion-surface interactions and analysis","kind":"topic-directory","aeo_cohort":"topic-directory","catalogue_revision":"f050b5d4780b1289","numeric_address":"36249286681710321","address_version":"morton4x16-v1","coordinates":[3,22,2206,12166],"answer_status":"Directory metadata; local answer requires separate source review","truth_status":"Subject descriptor, not a factual answer or a demonstrated knowledge gap","reviewed_answer":null}