{"id":"S2009000606","label":"Extreme ultraviolet lithography","description":"","source_url":"https://id.loc.gov/authorities/subjects/sh2009000606","normalized_label":"extreme ultraviolet lithography","broader":["http://id.loc.gov/authorities/subjects/sh85077598"],"aliases":["EUV lithography (Extreme ultraviolet lithography)","EUVL (Extreme ultraviolet lithography)","Far ultraviolet lithography"],"source_identifier":"http://id.loc.gov/authorities/subjects/sh2009000606","provider":"lcsh","revision":"b27ba99f51292bb4","taxonomy_revision":"f050b5d4780b1289","title":"Extreme ultraviolet lithography","url":"/topics/S2009000606","kind":"topic-directory","aeo_cohort":"topic-directory","catalogue_revision":"f050b5d4780b1289","numeric_address":"5534009450660258400","address_version":"morton4x16-v1","coordinates":[0,478,64426,30720],"answer_status":"Directory metadata; local answer requires separate source review","truth_status":"Subject descriptor, not a factual answer or a demonstrated knowledge gap","reviewed_answer":null}